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Green (524 nm) InGaN/GaN laser diodes with nano-porous cladding and deep-ridge waveguiding
Optics Express
|December 19, 2025
Summary
This study demonstrates green-emitting III-Nitride laser diodes using nano-porous GaN cladding. Deeply etched waveguides with sidewall passivation significantly reduced internal loss, enhancing device efficiency.
Area of Science:
- Optoelectronics
- Materials Science
- Semiconductor Devices
Background:
- III-Nitride semiconductors are crucial for optoelectronic devices.
- Achieving efficient green-wavelength emission from III-Nitride laser diodes remains a challenge.
- Nano-porous GaN cladding and advanced waveguide designs offer potential for performance enhancement.
Purpose of the Study:
- To demonstrate III-Nitride edge-emitting laser diodes operating at green wavelengths (524 nm).
- To investigate the impact of deeply etched ridge waveguides and atomic layer deposition (ALD) sidewall passivation on device performance.
- To analyze the reduction in internal loss and its correlation with improved carrier confinement and etch selectivity.
Main Methods:
- Fabrication of III-Nitride edge-emitting laser diodes with nano-porous GaN cladding.
- Implementation of deeply etched ridge waveguides and ALD sidewall passivation.
- Variable stripe length analysis and segmented contact absorption measurements to determine internal loss.
- Comparison with shallow-ridge reference lasers.
Main Results:
- Demonstration of green-wavelength (524 nm) III-Nitride laser diodes under pulsed electrical injection.
- Deep-ridge lasers showed significantly reduced internal loss from 35 cm-1 to 21 cm-1 compared to shallow-ridge lasers.
- Improved lateral carrier confinement and porous etch selectivity contributed to lower optical loss.
- Quasi-continuous-wave operation was achieved.
Conclusions:
- Deeply etched ridge waveguides combined with ALD passivation effectively enhance the performance of green-emitting III-Nitride laser diodes.
- Significant reduction in internal optical loss is achievable through optimized waveguide design and passivation.
- Further epitaxial improvements are necessary to overcome high threshold current density and low injection efficiency for practical applications.
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