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Inactivation of Pathogens via Visible-Light Photolysis of Riboflavin-5′-Phosphate
Published on: April 6, 2022
Novel Ru(II)-photo-antibiotics for the development of infection-resistant mask coatings
Arif Ali Mandal1, Saurav Kumar2, Srijan Singh1
1Department of Chemistry, Indian Institute of Technology (BHU), Varanasi, Uttar Pradesh 221005, India. samya.chy@iitbhu.ac.in.
Abstract:
Four novel Ru(II)-photoantibiotics (Ru1-Ru4) were developed to produce infection-resistant self-cleaning mask coatings. These photoantibiotics eliminate bacterial infections by generating oxidative stress and photothermal effects upon exposure to visible light (400-700 nm) with tuneable surface hydrophobicity.
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