The Ta Seed-Buffer Layer Microstructure and Its Influence on the Magnetic and Structural Parameters of CoFeB/MgO...

In this paper, we discuss the structural and magnetic properties of Ta(d)/Co₄₀Fe₄₀B₂₀/MgO/Ta multilayers. The CoFeB wedge layer was deposited on three buffers differing in Ta layer thickness: d = 5, 10, and 15 nm. A structural analysis showed that the Ta seed-buffer of 5 nm was amorphous, whereas thicker Ta grew in a β-tetragonal disordered structure. X-ray reflectivity measurements revealed that the Ta/CoFeB interface roughness for annealed samples ranged from 0.55 to 0.67 nm for a sample with a 0.85 nm CoFeB layer and decreased to approximately 0.47 nm for thicker CoFeB layers, while the average interface CoFeB/MgO thickness was about 0.2-0.3 nm. The morphological roughness of the amorphous single 5 nm Ta layer was the lowest, whereas crystalline grains in thicker Ta buffers induced higher roughness. The 5 nm thick MgO layer exhibited a strong (001)-oriented texture, which was the highest for the smoothest 5 nm Ta buffer. The magnetic dead layer thickness for the annealed sample with a 15 nm Ta buffer was 0.39 nm and increased with the decrease in the Ta buffer thickness. Temperature-dependent measurements offered further insight into the diffusion processes and the formation of the magnetic dead layer (MDL) at the Ta/CoFeB interface.