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Zhiyong Chen1,2,3,4, Chi Tu1,2,3,4, Haifeng Sun1,2,3
1National Key Laboratory of Optical Field Manipulation Science and Technology, Chinese Academy of Sciences, Chengdu 610209, China.
A new hybrid optimization algorithm (GA-HO) improves mask pattern accuracy in digital micromirror device lithography. This method enhances imaging performance by combining genetic algorithms with hippocampus optimization for better precision.
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