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Efficient Mask Optimization for DMD-Based Maskless Lithography Using a Genetic-Hippo Hybrid Algorithm.

Zhiyong Chen1,2,3,4, Chi Tu1,2,3,4, Haifeng Sun1,2,3

  • 1National Key Laboratory of Optical Field Manipulation Science and Technology, Chinese Academy of Sciences, Chengdu 610209, China.

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Summary
This summary is machine-generated.

A new hybrid optimization algorithm (GA-HO) improves mask pattern accuracy in digital micromirror device lithography. This method enhances imaging performance by combining genetic algorithms with hippocampus optimization for better precision.

Keywords:
Genetic–Hippo hybrid optimization algorithmmaskless lithographyoptical proximity effect correction

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Area of Science:

  • Micro/nanofabrication technologies
  • Optical engineering
  • Computational imaging

Background:

  • Mask optimization is crucial for digital micromirror device (DMD)-based maskless lithography.
  • Conventional algorithms struggle with complex patterns, slow convergence, and adaptability.
  • Optical proximity effects (OPE) cause linewidth variations and corner distortions.

Purpose of the Study:

  • To develop a hybrid optimization algorithm for enhanced mask pattern accuracy in DMD lithography.
  • To improve convergence speed, adaptability, and robustness in mask optimization.
  • To mitigate OPE-induced distortions for higher imaging fidelity.

Main Methods:

  • Proposed a hybrid Genetic-Hippo Optimization (GA-HO) algorithm.
  • Integrated Genetic Algorithm (GA) for global exploration and Hippocampus Optimization (HO) for local exploitation.
  • Employed grayscale modulation and a global-local cyclic search mechanism for adaptive optimization.

Main Results:

  • GA-HO achieved a 30% improvement in mask optimization accuracy for complex patterns, compared to 18% for standard GA.
  • Demonstrated smoother convergence, enhanced stability, and superior robustness.
  • Effectively suppressed linewidth variations and corner distortions, maintaining high imaging fidelity.

Conclusions:

  • The GA-HO framework offers an efficient, adaptable, and precise solution for DMD-based maskless lithography.
  • This hybrid approach provides a strong foundation for advancing micro/nanofabrication.
  • Highlights the potential of heuristic hybrid optimization for practical lithography applications.