A Promising Material for Biomedicine and Food Production Based on a Polymethyl Methacrylate-like Resin with Silicon...

Silicon dioxide (SiO₂) nanoparticles approximately 5 nm in size have been obtained. A method has been developed for introducing SiO₂ nanoparticles into photolithographic resin at concentrations up to 0.1%. Composite resins can be used to manufacture parts with complex geometries with a maximum achievable resolution of 50 μm. Parts made from composite resin with SiO₂ nanoparticles polish well. After polishing, areas of approximately 100 μm² with height differences of less than 10 nm are revealed on the surface of the parts. A relatively uniform distribution of SiO₂ nanoparticles is observed within the parts, and no optical defects are detected. However, areas differing in the phase shift of electromagnetic radiation are observed within the parts. Importantly, the presence of nanoparticles in the resin during MSLA printing increases the degree of resin polymerization. SiO₂ nanoparticles have been shown to have prooxidant properties, leading to the formation of 8-oxoguanine in DNA and long-lived reactive protein species. Components made from photolithographic resins with SiO₂ nanoparticles have been shown to inhibit the growth and development of E. coli bacteria, with a significant loss of viability. Despite their antimicrobial properties, components made from photolithographic resins with SiO₂ nanoparticles do not affect the growth and development of mammalian cells.