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Updated: May 8, 2026

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Tuning the Electronic and Optical Properties of Pristine and p-Type Al0.5Ga0.5As Nanowire Photocathodes via Intrinsic
1School of Information Technology, Jiangsu Open University, Nanjing 210036, China.
Abstract:
In this work, the effects of intrinsic point defects on the electronic and optical properties of both pristine and p-type-doped AlxGa1-xAs nanowires are investigated through first-principles calculations. The formation energy, band structure, charge density difference, density of states, work function, and optical absorption coefficient are analyzed. Results indicate that defects are more prone to formation in the surface layer of nanowires, with a gradual increase in formation energy as defects migrate toward the core region. Band structure and charge density difference analysis reveal that defects such as Gain, Alin, VAs, AsGa, and AsAl introduce donor impurity within the bandgap. In contrast, defects such as Asin, VGa, VAl, GaAs, and AlAs exhibit acceptor impurity characteristics, leading to an elevated work function and hindered electron emission. The former effectively reduces the electron escape barrier, while the latter increases the work function and hinders electron emission. Moreover, p-type doping promotes the formation of antisite defects while suppressing the generation of interstitial defects and vacancy defects. Notably, as the AsGa defect moves away from the p-type doping center, the local electron compensation efficiency diminishes, and the defect-induced donor energy level continuously shifts toward lower energy, resulting in a gradient reduction of bandgap. Furthermore, all defects can enhance the optical absorption capacity of AlxGa1-xAs nanowire photocathodes in the visible light range, especially for p-type doping nanowires.

