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Femtosecond Laser Non-Diffracting-Beam Lithography via Phase Modulation for Dielectric Metasurface Fabrication.

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  • 1Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing, China.

Advanced Materials (Deerfield Beach, Fla.)
|January 9, 2026
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Summary

A new femtosecond laser lithography technique enables precise fabrication of large-area dielectric phase-change metasurfaces. This breakthrough allows for programmable light control and advanced photonic devices with high uniformity and selectivity.

Keywords:
dielectric metasurfacefabricationfemtosecond laserlithographymodulationnon‐diffracting‐beam

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Area of Science:

  • Optoelectronics
  • Materials Science
  • Nanotechnology

Background:

  • Dielectric phase-change metasurfaces offer programmable light control but face fabrication challenges.
  • Current methods struggle with large-area uniformity, precision, and individual meta-atom modulation.

Purpose of the Study:

  • To introduce a novel fabrication technique for overcoming limitations in phase-change metasurface manufacturing.
  • To demonstrate high-precision, large-area fabrication of tunable metasurfaces.

Main Methods:

  • Developed femtosecond (fs)-laser phase-modulated non-diffracting-beam lithography (PNDL).
  • Utilized superposed axicon and blazed grating phases to create a quasi-Bessel non-diffracting beam.
  • Achieved maskless lithography through chemical processing of voxel metasurfaces.

Main Results:

  • Fabricated a tunable Ge$_{2}$Sb$_{2}$Te$_{5}$ metasurface with 9 nm feature size using PNDL.
  • Demonstrated dynamic beam deflection control with 7 nm precision.
  • Successfully fabricated and modulated multifunctional programmable photonic logic devices.

Conclusions:

  • PNDL offers a novel paradigm for active metasurface fabrication and modulation.
  • This technique enables high-uniformity, high-precision manufacturing of phase-change metasurfaces.
  • Paves the way for next-generation optoelectronic and photonic devices.