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Related Concept Videos

Ultraviolet and Visible (UV–Vis) Spectroscopy: Overview01:02

Ultraviolet and Visible (UV–Vis) Spectroscopy: Overview

Ultraviolet–visible (UV–visible or UV–Vis) spectroscopy is an analytical technique that investigates the interaction between matter and UV–Vis light within the electromagnetic spectrum. This method is widely used for its versatility, simplicity, and relatively quick data acquisition, making it valuable for both qualitative and quantitative analysis. When UV–Vis radiation passes through a material,  molecules absorb light depending on the energy required for electronic transitions. As a result...

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Related Experiment Video

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Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
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Hole-Patterned Pellicles: A Structural Approach for Improved Extreme Ultraviolet Transmittance and Mechanical

Haneul Kim1,2, Jungyeon Kim1, Young Woo Kang1,2

  • 1Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Republic of Korea.

Materials (Basel, Switzerland)
|January 10, 2026
PubMed
Summary

A novel hole-patterned pellicle design enhances extreme ultraviolet (EUV) lithography by improving transmittance and mechanical stability. This geometric approach offers a new avenue for pellicle optimization beyond traditional methods.

Keywords:
bulge testextreme ultraviolethole-patterned membraneimaging simulationpellicleporous structuretransmittance

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Area of Science:

  • Semiconductor Manufacturing
  • Materials Science
  • Optical Engineering

Background:

  • High-throughput extreme ultraviolet (EUV) lithography demands pellicles with optimal transmittance.
  • Conventional pellicle optimization methods (material choice, thinning) are reaching practical limits.
  • Alternative architectures are needed to overcome current limitations.

Purpose of the Study:

  • Investigate a hole-patterned pellicle architecture as an alternative to continuous films.
  • Analyze the impact of geometric design on EUV transmittance and mechanical properties.
  • Provide design-relevant trends for advanced pellicle development.

Main Methods:

  • EUV transmittance measurements to correlate with open ratio (OR).
  • Pseudo-spectral time domain (PSTD) simulations for structural and optical analysis.
  • Lithographic aerial-image simulations to assess pattern distortion.
  • Mechanical bulge tests for pressure-deflection and failure analysis.

Main Results:

  • Transmittance increases with OR, aligning with theoretical models but showing deviation at high OR.
  • Pattern distortion is minimal except under highly coherent illumination, suppressed by increasing radius sigma.
  • Hole-patterned membranes show altered pressure-deflection behavior and narrower failure distributions.
  • Periodic perforation influences transmittance and mechanical response.

Conclusions:

  • Hole-patterned pellicles offer a viable geometric design strategy for EUV lithography.
  • This approach complements existing material and thickness optimization techniques.
  • The study provides key insights into the trade-offs between transmittance, mechanical integrity, and defect sensitivity.