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Updated: Jul 2, 2026

Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Published on: July 2, 2012
Haneul Kim1,2, Jungyeon Kim1, Young Woo Kang1,2
1Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Republic of Korea.
A novel hole-patterned pellicle design enhances extreme ultraviolet (EUV) lithography by improving transmittance and mechanical stability. This geometric approach offers a new avenue for pellicle optimization beyond traditional methods.
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