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Structure and Magnetic Properties of Iron Thin Films Prepared at Different Deposition Times
Chunxia Zhou1, Liang Yan2, Biao Yan3
1School of Materials, Shanghai Dianji University, Shanghai 201306, China.
Abstract:
In this paper, a series of iron thin films were prepared using the direct current magnetron sputtering method at different deposition times. By means of characterization techniques such as X-ray diffraction (XRD), transmission electron microscopy (TEM), atomic force microscopy (AFM), and vibrating sample magnetometer (VSM), the structure, surface morphology, and magnetic properties of the iron thin films prepared at different deposition times were systematically investigated. The XRD results indicate that all the iron thin films exhibit a polycrystalline body-centered cubic structure, with an obvious preferred orientation in the (110) direction. As the deposition time increases, the average grain size of the iron thin films gradually increases. This is mainly because the post-sputtered atoms can provide the energy required for the formation, movement, and growth of the already deposited grains or clusters. When the deposition time is too long, factors such as elastic effects and size constraints will limit the growth of grains and clusters. Therefore, for the thin films deposited after 120 s, the average grain size gradually stabilizes. When the deposition time is short, the thin films usually grow in the form of island-like accumulation. Grains and clusters of uneven sizes accumulate on the substrate, so the roughness gradually increases. This also implies an increase in the density of defects such as internal stress and vacancies within the thin film. As the deposition time increases, the thin films gradually transform to grow in a layered and flat manner, and the grain size gradually stabilizes and becomes relatively uniform. Therefore, the roughness of the thin film samples decreases and tends to be stable. The magnetic property test results show that all the iron thin films exhibit ferromagnetism. The iron thin film prepared at a deposition time of 120 s has the best comprehensive performance, with a saturation magnetization Ms of 1567 emu/cm3, a coercivity of 92 Oe, and a remanence ratio of 0.86.
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