Related Experiment Video
Updated: Jan 14, 2026

Fabrication of Spatially Confined Complex Oxides
Published on: July 1, 2013
Internal Interfaces in Exfoliated MoS2 Exhibit Junction-like Behavior
Emilia S W Russell1, Oliver M Rigby2, Mark Heath3
1Department of Engineering, Durham University, Lower Mount Joy, South Road, DH1 3LE Durham, U.K.
None:
Mechanical exfoliation remains a ubiquitous method for material deposition in van der Waals layered semiconductors, despite usually producing terraced structures where the layer count changes across the flake, resulting in variations in the band gap magnitude across the device. While most published studies circumvent this phenomenon using sophisticated fabrication processes, these internal interfaces present a unique opportunity for the realization of engineered quantum building blocks within single-crystalline materials. The electronic structure of internal interfaces in MoS2, termed here "quasi-heterojunctions", is studied using a combination of photoluminescence and Raman spectroscopies, Kelvin probe force microscopy, and macroscopic transport measurements. In the transition between 5 to 2 to 1 layers within a single crystal, heterojunctions form, with band offsets of 22 and 24 meV in the conduction bands of the respective junctions. Variations of bandgap and electron affinity, as well as the formation of line defects, are shown to be the primary cause determining the rectification properties of the two junctions in series. Moreover, the formation of a line defect results in a space-charge region that introduces nonlinear properties to its response (I-V) curves. Finally, computational reconstruction of the measured surface potential using a finite element Poisson solver enables the determination of detailed electronic structures of the constituent segments and their quasi-heterojunctions.
More Related Videos
Related Concept Videos
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
Interfacial Electrochemical Methods: Overview
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET: Depletion Mode
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...

