Related Experiment Video
Updated: Jan 15, 2026

Author Spotlight: Advancements in High-Performance Thermoelectric Thin Films Through Radio Frequency Magnetron Sputtering
Published on: May 17, 2024
Synergistic Band and Interface Engineering via Dual Y/Ta Doping for High-Performance n-Type Mg3(Sb, Bi)2
Jie Zhang1, Xiao-Lei Shi2, Li Zhang1
1School of Materials Science and Engineering, Shaanxi Key Laboratory of Green Preparation and Functionalization for Inorganic Materials, Shaanxi University of Science & Technology, Xi'an, P. R. China.
Abstract:
Bi-rich n-type Mg3(Sb, Bi)2 alloys are promising thermoelectric materials for medium-to-low temperature applications due to their simple synthesis, low cost, and environmental friendliness. However, maintaining high performance over a wide temperature range remains challenging. Here, we employ a dual-doping strategy using Y and Ta to synergistically optimize electronic band structure and interfacial properties. Substituting Mg2+ with Y3+ tunes the Fermi level, increases carrier concentration, and preserves electrical conductivity. Ta forms metallic nanoinclusions that lower interfacial barriers, reduce grain-boundary scattering, and enhance phonon scattering through multiscale interfaces. This cooperative approach enables simultaneous optimization of charge and phonon transport, outperforming single-element doping. At the optimal composition, Mg3.48Bi1.5Sb0.5Y0.01Ta0.01 achieves ZT = 0.68 at 322 K, while Mg3.475Bi1.5Sb0.5Y0.01Ta0.015 reaches a peak ZT > 1.2 between 479 and 531 K and an average ZT of 1.05 over 300-600 K. A single-leg device exhibits a predicted conversion efficiency of 14.58% at a temperature difference of 464 K. These results demonstrate the effectiveness of combining Y doping with Ta nanophase engineering to simultaneously modulate electron and phonon transport, offering a new strategy for sustainable, high-performance n-type thermoelectrics.
More Related Videos
14:16Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
04:09Demonstrating the Simplicity and In Situ Temperature Monitoring of the Mechanochemical Synthesis of Metal Chalcogenides Suitable for Thermoelectrics
Published on: August 30, 2024
Related Concept Videos
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...