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Updated: Jun 25, 2026

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

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Published on: June 30, 2018

Water-Processable PVA-SbQ as an Eco-Friendly Photoreversible Dual-Tone Photoresist for Advanced Lithography.

Hyun-Jin Kim¹, Jun Ho Eom¹, Min-Jung Park¹

¹Department of Materials Science and Engineering, Chungnam National University, Daejeon, Republic of Korea.

Chemistry, an Asian Journal

|January 14, 2026

Summary

This study introduces an eco-friendly, water-processable photoresist, poly(vinyl alcohol)-N-methyl-4-formylstyrylpyridinium methosulfate (PVA-SbQ), which eliminates the need for organic solvents and photoinitiators in lithography.

Keywords:

photocleavage photodimerization photolithography photoreversibility styrylpyridinium

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Area of Science:

Materials Science
Polymer Chemistry
Lithography

Background:

Conventional photoresists utilize organic solvents and photoinitiators, posing environmental and processing challenges.
Advanced lithography demands sustainable and efficient photoresist materials.

Purpose of the Study:

To develop an eco-friendly, water-processable photoresist using poly(vinyl alcohol) modified with N-methyl-4-formylstyrylpyridinium methosulfate (PVA-SbQ).
To investigate the photoreversible dual-tone properties of PVA-SbQ without photoinitiators or organic solvents.

Main Methods:

PVA-SbQ copolymers synthesized via acetalization.
Structural characterization using NMR and FT-IR spectroscopy.
Photoreversible behavior analyzed via UV-vis and FT-IR, assessing photodimerization and photocleavage degrees.

Main Results:

Successful incorporation of SbQ moieties into PVA confirmed.
Efficient [2 + 2] cycloaddition photodimerization (∼91.3%) and partial photocleavage (∼51.3%) observed.
Optimized aqueous PVA-SbQ formulation achieved well-resolved negative-type, positive-type, and complex patterns.

Conclusions:

PVA-SbQ functions as a photoreversible dual-tone photoresist, offering a sustainable alternative.
The developed photoresist demonstrates excellent film-forming and photopatterning capabilities.
This innovation addresses environmental concerns associated with traditional photoresists in advanced lithography.