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Updated: Jan 17, 2026

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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
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Low-Density InGaAs/AlGaAs Quantum Dots in Droplet-Etched Nanoholes.
Saimon F Covre Da Silva1,2, Ailton J Garcia1, Maximilian Aigner1
1Institute of Semiconductor and Solid State Physics, Johannes Kepler University Linz, Altenberger Straße 69, 4040 Linz, Austria.
Nano Letters
|January 15, 2026
Summary
Epitaxial semiconductor quantum dots (QDs) grown using droplet etching epitaxy in AlGaAs offer tunable wavelengths for quantum photonics. This method yields high-quality QDs with desirable properties for on-demand single and entangled photon generation.
Area of Science:
- Materials Science
- Quantum Physics
- Nanotechnology
Background:
- Epitaxial semiconductor quantum dots (QDs) are crucial for on-demand single and entangled photon generation.
- Droplet etching epitaxy enables the growth of high-quality, strain-free QDs with controllable properties.
Purpose of the Study:
- To extend droplet etching epitaxy to In(Ga)As QDs in AlGaAs.
- To achieve longer emission wavelengths compared to traditional GaAs/AlGaAs QDs.
- To maintain the advantages of droplet etching epitaxy for quantum applications.
Main Methods:
- Utilized droplet etching epitaxy for In(Ga)As QD growth in an AlGaAs matrix.
- Characterized QD properties including density, fine structure splitting (FSS), and radiative lifetimes.
- Measured emission wavelengths at cryogenic temperatures.
Main Results:
- Achieved low QD densities of approximately 0.25 μm⁻².
- Observed very small excitonic fine structure splitting (FSS) as low as 3 μeV.
- Measured fast radiative lifetimes of around 300 ps.
- Extended the achievable emission wavelength to approximately 900 nm.
Conclusions:
- In(Ga)As QDs in AlGaAs grown by droplet etching epitaxy offer a promising platform for quantum photonics.
- The method preserves key advantages like low FSS and fast decay times.
- These QDs are well-suited for integrated quantum photonic devices requiring tunable emission wavelengths.

