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YOLO-LA: Prototype-Based Vision-Language Alignment for Silicon Wafer Defect Pattern Detection.

Ziyue Wang1, Yichen Yang2, Jianning Chu3

  • 1School of Intelligent Manufacturing, Jianghan University, Wuhan 430056, China.

Micromachines
|January 28, 2026
PubMed
Summary
This summary is machine-generated.

This study introduces YOLO-LA, a vision-language framework for wafer defect recognition. It enhances accuracy by combining visual patterns with defect descriptions, improving semiconductor manufacturing yield.

Keywords:
YOLOdefect detectionsemiconductorvision language modelwafer bin map

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Area of Science:

  • Semiconductor Manufacturing
  • Artificial Intelligence
  • Computer Vision

Background:

  • Semiconductor manufacturing requires precise process control to reduce variation and enhance yield.
  • Wafer defect pattern recognition is crucial for identifying root causes.
  • Current vision-based deep learning methods for defect recognition lack interpretability and generalization due to underutilization of semantic defect information.

Purpose of the Study:

  • To develop a lightweight vision-language alignment framework (YOLO-LA) for improved wafer defect recognition.
  • To enhance the interpretability and generalization of defect recognition models by integrating visual and textual data.
  • To improve the accuracy and efficiency of semiconductor manufacturing processes through better defect analysis.

Main Methods:

  • Proposed YOLO-LA, a framework integrating a frozen YOLO backbone and a frozen text encoder.
  • Introduced a learnable projection head to map visual features into a shared embedding space for cosine similarity-based classification.
  • Utilized prototype-based vision-language alignment to leverage semantic information from defect descriptions.

Main Results:

  • YOLO-LA consistently improved classification accuracy across various YOLO backbones on the WM-811K dataset.
  • The framework introduced minimal additional parameters, maintaining a lightweight profile.
  • YOLOv12 demonstrated the fastest inference speed with competitive accuracy, while YOLOv10 showed significant gains from semantic alignment.

Conclusions:

  • The proposed YOLO-LA framework effectively enhances wafer defect recognition by integrating visual and semantic information.
  • The lightweight and efficient design makes YOLO-LA suitable for real-time industrial wafer inspection systems.
  • Leveraging vision-language alignment offers a promising direction for improving interpretability and generalization in defect analysis for semiconductor manufacturing.