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Quick Rinse, Strong Bond? Comparing Short Water Rinsing and Advanced Cleaning Methods After Hydrofluoric Etching of

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A brief 15-second water rinse after hydrofluoric acid (HF) etching effectively cleans lithium disilicate surfaces, matching the bond strength of more complex methods. This simple technique ensures comparable total bond strength (TBS) for dental restorations.

Keywords:
cleaning methodshydrofluoric acidlithium disilicatetensile bond strength

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Area of Science:

  • Dental Materials Science
  • Surface Treatment
  • Adhesive Dentistry

Background:

  • Hydrofluoric acid (HF) etching is crucial for preparing lithium disilicate surfaces for bonding.
  • Effective post-etch cleaning is vital for achieving durable restorations.
  • Evaluating simpler cleaning protocols can optimize clinical workflows.

Purpose of the Study:

  • To compare the total bond strength (TBS) of lithium disilicate after various post-etch cleaning methods.
  • To determine if a short water rinse is as effective as advanced cleaning protocols.
  • To assess the impact of aging on bond strength and microleakage.

Main Methods:

  • Ninety-six lithium disilicate specimens were etched with 5% HF.
  • Six post-etch cleaning methods were evaluated, including water spray, brushing, and ultrasonic baths.
  • Specimens were bonded, aged (3 days or 150 days with thermal cycling), and tested for TBS, microleakage, and failure modes.

Main Results:

  • Aging significantly reduced TBS across all groups.
  • A 60-second water spray yielded higher TBS than phosphoric acid plus ultrasonic cleaning.
  • No significant differences in TBS were observed among most cleaning methods, including a 15-second water spray.

Conclusions:

  • A 15-second water spray after HF etching is a simple yet effective cleaning method.
  • This method achieves comparable total bond strength to more complex protocols.
  • Short water rinsing is a viable option for surface preparation in dental restorations.