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Updated: Feb 5, 2026

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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Synergistic Rh1-Cu1 Dual-Atom-Site Enhancing Performance of Ethane Low-Temperature Oxidation via Auto-Selective

Bin Li1, Siquan Feng1, Jiaqian Wang2

  • 1Dalian National Laboratory for Clean Energy, Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian, China.

Angewandte Chemie (International Ed. in English)
|February 4, 2026
PubMed

Keywords:
LUMO of Rh1Rh1–Cu1 dual‐siteauto‐selective oxygen source mechanismdeep step dehydrogenation

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