Cold plasma deposited thin-film nanocomposites for heterogeneous thermocatalysis - concepts and progress

There is no doubt that the development of chemical technologies is closely tied to progress in catalysis. Two aspects are crucial here: the search for new, efficient, selective, and stable nanocatalysts tailored to specific reactions and obtaining them in forms best suited for modern catalytic systems, such as structured reactors. Both challenges fit perfectly within the capabilities of cold (non-equilibrium) plasma thin-film deposition technology. The enormous potential of this technology for producing new nanocomposite materials with predetermined molecular structures, nanostructures, and electronic structures that are so crucial for catalytic properties seems unrivaled. This review summarizes recent progress in cold plasma deposition methods, including low-pressure plasma-enhanced chemical vapor deposition (PECVD), atmospheric-pressure plasma deposition (APPD), and plasma-enhanced atomic layer deposition (PEALD), and highlights their usefulness in fabricating thin films on 3D supports as packings for catalytic structured reactors. Advances in plasma deposition of nanocomposite films and the design of their architectures for catalytic activity are also discussed, with particular focus on emerging research involving nanoscale heterojunctions. Furthermore, the most important chemical processes currently being tested using plasma-derived nanocatalysts are presented, providing strong evidence of their practical applicability. Overall, this work demonstrates the significant potential of cold plasma technology for the design and fabrication of innovative nanocatalysts.