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Disulfide-Induced Inhibition of Epoxy Cationic Photopolymerization: A Route to Maskless Patterning.
Alberto Spessa1, Roberta Bongiovanni1,2, Alessandra Vitale1,2
1Department of Applied Science and Technology, Politecnico Di Torino, Torino, Italy.
Disulfide diols can quench photoinduced cationic ring-opening polymerization of epoxy monomers. This inhibition mechanism enables maskless photolithography for creating epoxy coatings with defined patterns down to 200 µm.
Area of Science:
- Polymer Chemistry
- Photolithography
- Materials Science
Background:
- Photoinduced cationic ring-opening polymerization (ROP) of epoxy monomers is sensitive to chain transfer reactions.
- Monosulfides are known inhibitors of epoxy ROP, even at low concentrations.
Purpose of the Study:
- To investigate the role of disulfide-containing diols in quenching epoxy ROP.
- To explore the potential of disulfide-mediated inhibition for maskless photolithography.
Main Methods:
- Studied the effect of a disulfide-containing diol on a difunctional epoxy formulation undergoing photoinduced cationic ROP.
- Investigated the influence of sulfur:epoxy ratio on polymerization inhibition.
- Demonstrated spatially controlled patterning of epoxy coatings using localized disulfide diol deposition.
Main Results:
- Disulfide diols inhibit epoxy ROP, but polymerization can initiate.
- Effective polymerization quenching occurs at high sulfur:epoxy ratios.
- Sharply defined epoxy features down to 200 µm were fabricated using this method.
Conclusions:
- Disulfide-mediated polymerization quenching offers a novel approach for epoxy photopatterning.
- This method is versatile and material-efficient for creating patterned epoxy coatings.
- Spatially controlled feature fabrication is achievable through localized disulfide diol application.
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