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Patterning via Optical Saturable Transitions - Fabrication and Characterization
Published on: December 11, 2014
Repeated pattern detection on fabric: A survey and novel approach
Ebru Ayyurek1, Matteo Marcuzzo1, Alessandro Zangari1,2
1Ca' Foscari Department of Environmental Sciences, Informatics and Statistics, Ca' Foscari University of Venice, Mestre, VE, Italy.
Abstract:
Modern textile industries frequently apply patterns, such as brand logos or motifs, in near-regular arrangements to create visually appealing products. Consequently, the application of computer vision for pattern recognition is highly valuable for automating production chains and reducing waste. In this work, we address the challenging task of automatically detecting repeating patterns on fabric images, accounting for real-world complexities such as variable lighting and intentional pattern variance. We begin with an in-depth literature review on repeated pattern detection, highlighting current trends, organizing them into a hierarchy of sub-tasks, and discussing the novelty of each paper. Subsequently, we propose a novel method to solve our specific instance of this problem, focusing on detecting patterns with sub-pixel accuracy. We conduct extensive experiments to compare its performance against several baselines from the literature. Our method can be applied with high precision to real-world problems without requiring training data, instead using an automatic calibration procedure with limited human supervision. On a small synthetic dataset, our method detects repeated patterns with a 96% recall rate and an average alignment error of less than 0.5 pixels in just a few seconds, making it competitive with all tested baselines. Finally, we release our dataset and the code for its generation to encourage further research in this area.
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