Facile optimization of combinatorial sputtering processes with arbitrary numbers of components for targeted...

Area of Science:

• Materials Science
• Thin Film Deposition
• Physical Vapor Deposition

Background:

• Combinatorial sputtering allows high-throughput synthesis of compositionally varied thin films.
• Mapping stoichiometry effects on properties requires precise control over film composition.
• Optimizing sputter power for multiple components is complex and often iterative.

Purpose of the Study:

• To introduce a novel composition optimization procedure for sputtered combinatorial films.
• To enable facile synthesis of thin films with targeted compositions.
• To overcome the limitations of guess-and-check methods in combinatorial sputtering.

Main Methods:

• Leveraging wavelength dispersive x-ray fluorescence for rapid composition mapping.
• Developing a procedure to optimize sputter power for arbitrary numbers of components.
• Demonstrating the method by sputtering a combinatorial CrvFewMoxNbyTaz film.

Main Results:

• Successful implementation of a composition optimization procedure.
• Facile synthesis of sputtered combinatorial films with targeted compositions.
• Demonstrated capability for optimizing processing for multiple components.

Conclusions:

• The developed procedure simplifies the synthesis of combinatorial films with specific stoichiometries.
• This method enhances the high-throughput advantages of combinatorial sputtering.
• Enables precise control over alloy thin film composition for property mapping.