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Atomic-Scale Insights into Alloying-Induced Interfacial Stability, Adhesion, and Electronic Structure of Mg/Al3Y
Yunxuan Zhou1,2, Liangjuan Gao3, Quanhui Hou4
1Lanxi Magnesiun Materials Research Institute, Lanxi 321100, China.
Abstract:
This work aims to enhance the stability of the Mg/Al3Y interface through first-principles investigations of low-cost dopants. Density functional theory calculations were employed to systematically examine the bulk properties of Mg and Al3Y, as well as the structural stability, electronic characteristics, and alloying element effects at the Mg(0001)/Al3Y(0001) interface. The calculated lattice parameters, elastic moduli, and phonon spectra demonstrate that both Mg and Al3Y are dynamically stable. Owing to the similar hexagonal symmetry and a small lattice mismatch (~1.27%), a low-strain semi-coherent Mg(0001)/(2 × 2)Al3Y(0001) interface can be constructed. Three representative interfacial stacking configurations (OT, MT, and HCP) were examined, among which the MT configuration exhibits significantly higher work of adhesion, indicating superior interfacial stability. Differential charge density and density of states analyses reveal pronounced charge transfer from Mg to Al/Y atoms and strong orbital hybridization, particularly involving Y-d states, which underpins the enhanced interfacial bonding. Furthermore, the segregation behavior and adhesion enhancement effects of typical alloying elements (Si, Ca, Ti, Mn, Cu, Zn, Zr, and Sn) were systematically evaluated. The results show that Mg-side interfacial sites, especially Mg2 and Mg3, are thermodynamically favored for segregation, with Zr and Ti exhibiting the strongest segregation tendency and the most significant improvement in interfacial adhesion. These findings provide fundamental insights into interfacial strengthening mechanisms and offer guidance for the alloy design of high-performance Mg-based composites.
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