Semiconductors
Types of Semiconductors
Metal-Semiconductor Junctions
MOSFET: Enhancement Mode
Non-ohmic Devices
Biasing of Metal-Semiconductor Junctions
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Updated: Feb 19, 2026

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Haksoon Jung1, Joonghoon Choi2, Seunghun Baek3
1Department of Electrical Engineering, Ulsan National Institute of Science and Technology (UNIST), UNIST-gil 50, Eonyang-eup, Ulju-gun, Ulsan 44919, Republic of Korea.
High-performance computing requires advanced integration. Monolithic 3D integration with 2D materials and photonic interconnects offer solutions for next-generation AI hardware, addressing bandwidth and thermal challenges.
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