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    This study introduces a novel interferometer using orbital angular momentum (OAM) beams for precise nano-displacement measurement. The system achieves sub-2nm resolution for both in-plane and out-of-plane movements, enhancing environmental robustness.

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    Area of Science:

    • Optics and Photonics
    • Nanotechnology
    • Metrology

    Background:

    • Precise measurement of nano-displacements is crucial for advanced manufacturing and scientific research.
    • Traditional interferometers face limitations in environmental robustness and resolution.

    Purpose of the Study:

    • To develop a Littman-configured interferometer utilizing orbital angular momentum (OAM) beams for high-resolution nano-displacement measurement.
    • To investigate the system's capability for both in-plane and out-of-plane displacement detection.

    Main Methods:

    • Generation of petal-like interferograms via interference of conjugate OAM beams.
    • Diffraction of a reference OAM beam from a scale grating to create a measured beam.
    • Demodulation of interferogram rotation angle using circular cross-correlation for displacement calculation.

    Main Results:

    • Theoretical analysis shows 1° interferogram rotation corresponds to 2.313 nm in-plane and 1.067 nm out-of-plane displacement.
    • Experimental results demonstrate maximum errors of 1.299 nm (in-plane) and 1.898 nm (out-of-plane).
    • Achieved displacement resolutions better than 2 nm for both measurement types.

    Conclusions:

    • The OAM interferometer in a Littman configuration effectively transfers the measurement standard to the grating pitch for in-plane measurements.
    • Out-of-plane displacement is influenced by both grating pitch and wavelength.
    • The proposed method offers enhanced environmental robustness and high displacement resolution.