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Mastering the master: surface relief grating masters for AR, VR, and MR applications
Astrit Shoshi1, Julian Hartbaum1, Stephan Martens1
1Institut für Mikroelektronik Stuttgart, IMS CHIPS, Stuttgart, Germany.
Nanotechnology
|February 23, 2026
Summary
Advanced electron beam lithography and etching techniques enable precise nanopatterning of surface relief gratings (SRGs). This is crucial for creating efficient optical elements for augmented and virtual reality devices, ensuring uniform eye-box illumination.
Area of Science:
- Optics and Photonics
- Nanotechnology
- Display Technology
Background:
- Augmented, virtual, and mixed reality (AR/VR/MR) devices require compact optical elements.
- Surface relief gratings (SRGs) are key for diffractive optical waveguides in AR/VR/MR.
- Uniform eye-box illumination is critical for AR/VR/MR display clarity.
Purpose of the Study:
- To demonstrate advanced nanopatterning techniques for surface relief gratings (SRGs).
- To achieve precise control over SRG features for improved optical performance in AR/VR/MR devices.
- To explore fabrication methods for high-performance diffractive optical elements.
Main Methods:
- Utilized advanced electron beam lithography for master stamp fabrication.
- Employed reactive ion beam trimming etching for precise pattern transfer and shaping.
- Investigated control over sidewall angle, pitch, critical dimension, and depth variation.
Main Results:
- Demonstrated high-fidelity nanopatterning of slanted and blazed SRGs.
- Achieved precise control over SRG sidewall angle and shape.
- Showcased modulation capabilities for pitch, critical dimension, and continuous depth variation.
Conclusions:
- Electron beam lithography and reactive ion beam trimming are effective for fabricating high-performance SRGs.
- These techniques offer precise control over nanoscale features essential for AR/VR/MR optical elements.
- The demonstrated methods support the development of advanced diffractive optical waveguides for immersive technologies.
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