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Scanning-Based Dynamic Mask Projection for Ultrafast Laser Ablation of Thin Films.

Jonas Amann1, Markus Kircher1, Andreas Otto1

  • 1Institute of Production Engineering and Photonic Technologies, TU Wien, Getreidemarkt 9, 1060 Vienna, Austria.

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Summary

This study introduces dynamic mask projection with galvanometric scanning to overcome laser processing limitations. This novel approach achieves high-throughput nanoprocessing with sub-micrometer resolution for advanced material fabrication.

Keywords:
digital micromirror devicefemtosecond laserlaser ablationmask projectionmask scanningtantalum nitridethin film

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Area of Science:

  • Materials Science
  • Optical Engineering
  • Nanotechnology

Background:

  • Ultrafast laser processing faces a trade-off between processing speed (throughput) and feature precision (resolution).
  • Existing methods rely on either slow, high-resolution single-beam scanning or lower-resolution parallel processing.
  • A need exists for techniques that combine high throughput with sub-micrometer resolution in laser-based fabrication.

Purpose of the Study:

  • To present a novel scanning-based dynamic mask projection concept for ultrafast laser processing.
  • To integrate a digital micromirror device (DMD) with galvanometric scanning for enhanced laser ablation.
  • To demonstrate high-throughput, high-resolution patterning on thin films.

Main Methods:

  • A dynamic binary amplitude mask was generated using a digital micromirror device (DMD).
  • Galvanometric scanning was employed for high-speed lateral repositioning of the projected mask pattern.
  • A high-numerical-aperture microscope objective projected the mask for sub-micrometer feature ablation.
  • The system was tested on 10 nm tantalum nitride (TaN) thin films using femtosecond laser pulses.

Main Results:

  • Achieved selective single-pulse pattern ablation of TaN thin films.
  • Demonstrated a minimum feature size of 770 nm.
  • Processed a scan field with an area-equivalent circular diameter of 550 µm.
  • Successfully combined dynamic mask projection with fast scanning.

Conclusions:

  • The dynamic mask projection concept effectively merges high throughput and high resolution in laser processing.
  • This method offers a scalable solution for laser nanoprocessing applications.
  • The technique is applicable to nanomaterial fabrication, digital mask lithography, and micro/nanomachining.