Passivating Interfacial Pore Defects with Light Atoms To Enhance Heat Transport Across Cu/a-SiO2 Interfaces.

Yufan Li1, Linmao Song1, Jun Lyu1

  • 1School of Advanced Manufacturing and Robotics, Peking University, Beijing 100871, P. R. China.

Nano Letters
|February 26, 2026
PubMed
Summary

Interfacial thermal conductance in 3D integrated circuits is hindered by pores and light atoms. Understanding their combined effects is crucial for effective heat dissipation in advanced electronics.