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One Method for Improving Overlay Accuracy Through Focus Control.

Yanping Lan1, Jingchao Qi1, Mengxi Gui2

  • 1Shanghai Yuwei Semiconductor Technology Co., Ltd., Shanghai 201203, China.

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|February 27, 2026
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Summary
This summary is machine-generated.

This study introduces an integrated approach using dual-wavelength optics and deep learning for precise semiconductor overlay measurement. The method enhances both accuracy and efficiency in advanced process nodes.

Keywords:
IBOdual-wavelength opticalfocal plane measurementmark alignmentoverlay

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Area of Science:

  • Semiconductor Manufacturing
  • Optical Metrology
  • Image Processing

Background:

  • Overlay measurement accuracy is critical for semiconductor fabrication.
  • Focal plane detection significantly impacts overlay accuracy and measurement throughput.
  • Advanced process nodes demand improved accuracy and efficiency.

Purpose of the Study:

  • To develop an integrated optimization strategy for overlay measurement.
  • To address the trade-off between accuracy and efficiency in advanced process nodes.
  • To improve both accuracy and efficiency of overlay measurement.

Main Methods:

  • Implemented a dual-wavelength, dual-detector optical hardware architecture.
  • Selected independent optimal imaging wavelengths for different layers.
  • Employed a deep learning framework for real-time alignment and defocus prediction.
  • Utilized synergistic hardware and software strategies for optimal imaging posture.

Main Results:

  • Achieved ideal imaging conditions for each layer without interference.
  • Enabled simultaneous prediction and adjustment of horizontal position and defocus.
  • Effectively mitigated background noise and system aberrations.
  • Significantly improved both accuracy and efficiency of overlay measurement.

Conclusions:

  • The integrated optimization strategy enhances overlay measurement performance.
  • Dual-wavelength optics and deep learning synergize for superior results.
  • This method is crucial for meeting the demands of advanced semiconductor process nodes.