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Precise Tailoring 3D Printed In Situ Toughening Low-k Microwave Transparent Structure via Thiol-acrylate Chain
Ce Bian1,2, Kai Zheng1,2, Ruoyu Chen1,2
1National Engineering Research Center of Electromagnetic Radiation Control Materials, University of Electronic Science and Technology of China (UESTC), Chengdu, China.
Advanced Science (Weinheim, Baden-Wurttemberg, Germany)
|March 10, 2026
Summary
A new toughening strategy enhances triazine resins for advanced low-dielectric (low-k) materials, improving printability and mechanical properties for engineering applications.
Area of Science:
- Materials Science
- Polymer Chemistry
- Additive Manufacturing
Background:
- Triazine resins possess unique electromagnetic properties suitable for low-dielectric (low-k) materials.
- However, their poor printability and brittleness limit practical engineering applications.
- Existing plasticization methods often degrade essential dielectric and mechanical performance.
Purpose of the Study:
- To develop a novel in situ toughening strategy for triazine-based resins.
- To enable Digital Light Processing (DLP) printing of robust, low-k materials.
- To overcome the limitations of conventional plasticization techniques.
Main Methods:
- An in situ thiol-acrylate chain transfer-mediated toughening approach was employed.
- A triazine resin system with isobornyl acrylate (IBOA) and polysulfide rubber (PSR) was formulated.
- The resin was optimized for low viscosity (<150 cP) and high photosensitivity for DLP printing.
Main Results:
- The optimized resin achieved 50 µm resolution printing with a low dielectric constant (ε' = 2.66).
- The toughened material exhibited a 462.4% increase in elongation at break and a 640.5% improvement in toughness.
- High tensile strength (45.7 MPa) was maintained alongside enhanced flexibility.
- A printed gyroid lattice structure demonstrated 92% transmittance at 10 GHz.
Conclusions:
- The developed toughening strategy successfully addresses the printability and brittleness issues of triazine resins.
- This approach enables the fabrication of high-performance, low-k materials for advanced applications.
- The optimized materials show promise for applications requiring both mechanical integrity and electromagnetic transparency.

