Related Experiment Video
Updated: May 2, 2026

Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
Published on: June 3, 2015
Robust Aluminum Nitride Passivation of Silicon Carbide with Near-Surface Quantum Emitters for Quantum Computing and
Cyrille Armel Sayou Ngomsi1, Sai Krishna Narayanan2, Pratibha Dev1,3
1Department of Physics and Astronomy, Howard University, Washington, D.C. 20059, United States.
Abstract:
Silicon carbide (SiC) hosts a number of point defects that are being explored as single-photon emitters for quantum applications. Unfortunately, these quantum emitters lose their photostability when placed in the proximity of the surface of the host semiconductor. In principle, a uniform passivation of the surface's dangling bonds by simple adsorbates, such as hydrogen or mixed hydrogen/hydroxyl groups, should remove detrimental surface effects. However, the usefulness of atomic and molecular passivation schemes is limited by their lack of long-term chemical and/or thermal stability. In this first-principles work, we use aluminum nitride (AlN) to passivate SiC surfaces in a core-shell nanowire model. By using a negatively charged silicon vacancy in SiC as the proof-of-principle quantum emitter, we show that AlN-passivation is effective in removing SiC surface states from the bandgap and in restoring the defect's optical properties. We also report the existence of a silicon vacancy-based defect at the SiC-AlN interface, which displays distinct spin and optical properties as compared to the other well-studied defects in SiC.
More Related Videos
11:33All-electronic Nanosecond-resolved Scanning Tunneling Microscopy: Facilitating the Investigation of Single Dopant Charge Dynamics
Published on: January 19, 2018
07:00Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes
Published on: June 25, 2020
Related Concept Videos
Mass Spectrometers
Mass Analyzers: Overview
Mass Analyzers: Common Types
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview
Atomic Emission Spectroscopy: Instrumentation
Atomic Emission Spectroscopy: Lab