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Phase mask localization for multi-pass cavity and mode conversion.

Wenxuan Xu, Li Pei, Jianshuai Wang

|March 17, 2026

Summary

This summary is machine-generated.

This study introduces an image-processing method for precise phase mask alignment in multiple plane light conversion (MPLC). This technique enhances optical beam manipulation efficiency and robustness in complex systems.

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Area of Science:

Optics and Photonics
Optical Engineering
Image Processing

Background:

Multiple plane light conversion (MPLC) is crucial for mode manipulation but is sensitive to optical element misalignment.
Accurate alignment of phase masks with optical beams is essential for MPLC system performance.

Purpose of the Study:

To develop an image-processing-based method for precise phase mask localization in MPLC systems.
To improve alignment accuracy and overcome the sensitivity to misalignment in MPLC.

Main Methods:

A novel image-processing technique analyzes the correlation between phase mask lateral shifts and beam mode coefficients.
Sub-pixel precision is achieved without complex optical setups or advanced algorithms.
The method was experimentally verified using standard optical modes (LP01, LP11a, LP21a).

Main Results:

The proposed method achieved high alignment accuracy for phase masks and optical beams.
Phase mask localization was completed in under 3 minutes for tested modes.
Experimental results showed >90% similarity to theoretical predictions.

Conclusions:

The image-processing-based phase mask localization offers a practical and effective solution for MPLC.
This method enhances the efficiency and robustness of multi-pass cavity systems.
The technique provides sub-pixel precision for beam center localization through direct analysis.