Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

[Identification of Placenta hominis and its adulterants using COI barcode].

Zhongguo Zhong yao za zhi = Zhongguo zhongyao zazhi = China journal of Chinese materia medica·2014
Same author

Two new species of Austrophthiracarus (Acari: Oribatida: phthiracaridae) from New Zealand.

Zootaxa·2014
Same author

The genus Notophthiracarus of New Zealand (Acari: Oribatida: Phthiracaridae): three new species and a key to 24 described species.

Zootaxa·2014
Same author

MHC class II restricted innate-like double negative T cells contribute to optimal primary and secondary immunity to Leishmania major.

PLoS pathogens·2014
Same author

Hepatic perfusion parameters of contrast-enhanced ultrasonography correlate with the severity of chronic liver disease.

Ultrasound in medicine & biology·2014
Same author

Dietary accumulation of tetrabromobisphenol A and its effects on the scallop Chlamys farreri.

Comparative biochemistry and physiology. Toxicology & pharmacology : CBP·2014
Same journal

Multifunctional reconfigurable terahertz metasurface based on vanadium dioxide phase transition: achieving broadband absorption and efficient polarization conversion.

Applied optics·2026
Same journal

High-Q-factor electromagnetically induced transparency utilizing quasi-bound states in the continuum in an all-dielectric terahertz metasurface.

Applied optics·2026
Same journal

Automated stitching interferometry for high-precision metrology of X-ray mirrors.

Applied optics·2026
Same journal

Experimental demonstration of an approach to designing a metal-dielectric DBR resonant cavity structure.

Applied optics·2026
Same journal

High-precision wavefront reconstruction from a single-shot interferogram using a physics-driven hybrid feature calibration network.

Applied optics·2026
Same journal

Ultra-high-Q Fano resonance based on coupled topological corner states in Kagome photonic crystals.

Applied optics·2026
See all related articles

Related Experiment Video

Updated: Mar 19, 2026

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
06:21

Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

Published on: January 25, 2021

3.4K

Design method for wafer alignment marks with low alignment position deviation under process-induced asymmetry.

Lijun Zhou, Xiangzhao Wang, Zhongliang Li

    Applied Optics
    |March 17, 2026
    PubMed
    Summary
    This summary is machine-generated.

    This study introduces a new design method for segmented grating alignment marks to improve wafer alignment accuracy in semiconductor manufacturing. The approach minimizes alignment position deviation, enhancing overlay accuracy for advanced lithography processes.

    More Related Videos

    Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
    09:45

    Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

    Published on: June 12, 2018

    10.2K
    Establishing Single-Cell Based Co-Cultures in a Deterministic Manner with a Microfluidic Chip
    07:05

    Establishing Single-Cell Based Co-Cultures in a Deterministic Manner with a Microfluidic Chip

    Published on: September 27, 2019

    6.6K

    Related Experiment Videos

    Last Updated: Mar 19, 2026

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
    06:21

    Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices

    Published on: January 25, 2021

    3.4K
    Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies
    09:45

    Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

    Published on: June 12, 2018

    10.2K
    Establishing Single-Cell Based Co-Cultures in a Deterministic Manner with a Microfluidic Chip
    07:05

    Establishing Single-Cell Based Co-Cultures in a Deterministic Manner with a Microfluidic Chip

    Published on: September 27, 2019

    6.6K

    Area of Science:

    • Materials Science
    • Electrical Engineering
    • Optical Engineering

    Background:

    • High-precision wafer alignment is crucial for advanced semiconductor manufacturing, particularly in immersion, extreme ultraviolet (EUV), and high-NA EUV lithography.
    • Process-induced asymmetry in alignment mark structures, such as from chemical-mechanical polishing, is a major cause of alignment position deviation (APD) and reduced overlay accuracy.

    Purpose of the Study:

    • To develop a systematic design methodology for segmented grating alignment marks.
    • To address the root cause of alignment position deviation by optimizing mark geometry.
    • To enhance overlay accuracy in advanced-node semiconductor manufacturing.

    Main Methods:

    • Parameterization of mark geometry coupled with finite-difference time-domain (FDTD) simulations.
    • Application of a non-dominated sorting genetic algorithm II (NSGA-II) for multi-objective optimization.
    • Simultaneous maximization of diffraction efficiency and minimization of APD under asymmetric deformation.

    Main Results:

    • Demonstrated a systematic design methodology for segmented grating alignment marks.
    • Successfully optimized mark geometry to minimize alignment position deviation (APD).
    • Achieved simultaneous improvements in diffraction efficiency and APD reduction for asymmetric deformations.

    Conclusions:

    • The proposed multi-objective optimization approach is effective and feasible for designing advanced alignment marks.
    • This methodology provides a pathway to enhance overlay accuracy in next-generation semiconductor lithography.
    • The systematic design improves resilience to process-induced asymmetries in alignment structures.