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Updated: Mar 19, 2026
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Comparison of Agreement and Accuracy using Binocular Wavefront Optometer with Autorefractor and Phoropter
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Fast and high-fidelity curvilinear optical proximity correction using boundary iterative optimization.
Applied Optics
|March 17, 2026
Summary
This study introduces a new curvilinear mask optical proximity correction (OPC) method. It optimizes both movement direction and distance for control points, improving print image fidelity and reducing computation time.
Area of Science:
- Semiconductor Manufacturing
- Nanofabrication
- Computational Lithography
Background:
- Curvilinear masks offer advantages in optical lithography.
- Current curvilinear optical proximity correction (OPC) methods often overlook movement direction optimization.
Purpose of the Study:
- To propose an advanced curvilinear mask OPC method.
- To simultaneously optimize control point movement direction and distance.
Main Methods:
- Boundary iteration optimization method.
- Defining regions of interest around control points in mask patterns and print images.
- Simultaneous adjustment of movement direction and distance.
Main Results:
- Achieved higher fidelity of the printed image.
- Reduced computational time compared to existing methods.
- Enhanced optimization degrees of freedom.
Conclusions:
- The proposed boundary iteration method effectively improves curvilinear mask OPC.
- Simultaneous optimization of direction and distance leads to superior results.
- This method is a significant advancement for optical lithography.
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