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Updated: Mar 19, 2026

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Watt-class 368 nm UVA light-emitting diode grown on Si with a polarization-doped electron blocking layer
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A watt-class 368 nm ultraviolet-A light-emitting diode (UVA LED) grown on Si substrate has been successfully demonstrated. By introducing a polarization-doped electron blocking layer (EBL) featuring graded Al composition (decreasing from 38% to 28%), the energy barrier for electron leakage was significantly raised. This modification led to a marked increase in hole concentration in the active region. After removing the Si substrate and fabricating the thin-film flip-chip LEDs, a 368 nm emission output power of 1015 mW was achieved under 500 mA, corresponding to an external quantum efficiency (EQE) of 60.3% and a wall-plug efficiency of 54.6%. Moreover, the device maintains a high EQE of 54.1% even at a high current density of 164 A·cm-2, representing an absolute efficiency drop of only 6.2%. The as-fabricated UVA LED also exhibits excellent reliability with over 92% of its initial power after 1,000 hours of aging testing. This work represents a significant step toward the industrial application of high-power UVA-LEDs grown on Si.
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