Single-frame randomized probe imaging in the EUV using a high-order harmonic source

Area of Science:

• Physics
• Optics
• Materials Science

Background:

• High-resolution imaging is crucial for scientific advancements.
• Extreme ultraviolet (EUV) light offers unique capabilities for nanoscale imaging.
• Table-top high-harmonic generation (HHG) sources provide compact EUV generation.

Purpose of the Study:

• To demonstrate single-frame randomized probe imaging (RPI) using a table-top EUV source.
• To investigate the impact of different beam structures (smooth, vortex, speckle) on RPI resolution.
• To assess the potential of RPI for rapid, high-resolution imaging applications.

Main Methods:

• Utilized a 13.5 nm EUV beam from a table-top HHG source.
• Employed single-frame RPI with smooth, vortex, and speckle illumination patterns.
• Performed comparative analysis with ptychography reconstructions.
• Investigated resolution enhancement through averaging multiple RPI frames.

Main Results:

• Achieved single-frame RPI reconstructions for all tested beam types.
• Obtained a highest resolution of 110 nm using the EUV speckle beam.
• Demonstrated improved convergence and image fidelity with structured illuminations compared to a smooth beam.
• Enhanced resolution to sub-100 nm by averaging RPI images.

Conclusions:

• Single-frame RPI is a viable technique for rapid, high-resolution EUV imaging.
• Structured illuminations, particularly speckle beams, enhance RPI performance.
• RPI shows promise for applications requiring fast imaging, such as ultrafast pump-probe studies and real-time feedback.