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Seidel-based position-dependent aberration correction in Fourier holography.

Antoni J Wojcik, Dilawer Singh, Ayan Rakshit

|March 18, 2026

Summary

This summary is machine-generated.

This study introduces a new framework to fix image distortions in Fourier holography. It improves image sharpness across the entire field of view by correcting position-dependent pupil aberrations.

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Last Updated: Mar 19, 2026

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Area of Science:

Optics and Photonics
Holography
Image Processing

Background:

Position-dependent pupil aberrations degrade image quality in Fourier holographic systems.
Accurate modeling and correction of these aberrations are crucial for high-fidelity holographic displays.

Purpose of the Study:

To develop a comprehensive framework for modeling, measuring, and correcting position-dependent pupil aberrations in Fourier holography.
To enhance image sharpness and quality across the entire field of view.

Main Methods:

Characterization of aberrations using six coefficients: four Seidel terms, tip, and tilt.
Development of two diffraction integral approximations: a series expansion and a patch-based method.
Estimation of aberration coefficients through optimization on a grid of target markers.

Main Results:

Demonstrated substantial improvements in image sharpness.
Effective correction of aberrations across the entire field of view.
Validation of the framework through experiments on a compact Fourier holographic projector.

Conclusions:

The proposed framework provides an effective solution for correcting position-dependent pupil aberrations in Fourier holography.
This work significantly advances the potential for high-quality holographic imaging and display technologies.