Seidel-based position-dependent aberration correction in Fourier holography

Area of Science:

• Optics and Photonics
• Holography
• Image Processing

Background:

• Position-dependent pupil aberrations degrade image quality in Fourier holographic systems.
• Accurate modeling and correction of these aberrations are crucial for high-fidelity holographic displays.

Purpose of the Study:

• To develop a comprehensive framework for modeling, measuring, and correcting position-dependent pupil aberrations in Fourier holography.
• To enhance image sharpness and quality across the entire field of view.

Main Methods:

• Characterization of aberrations using six coefficients: four Seidel terms, tip, and tilt.
• Development of two diffraction integral approximations: a series expansion and a patch-based method.
• Estimation of aberration coefficients through optimization on a grid of target markers.

Main Results:

• Demonstrated substantial improvements in image sharpness.
• Effective correction of aberrations across the entire field of view.
• Validation of the framework through experiments on a compact Fourier holographic projector.

Conclusions:

• The proposed framework provides an effective solution for correcting position-dependent pupil aberrations in Fourier holography.
• This work significantly advances the potential for high-quality holographic imaging and display technologies.