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    Area of Science:

    • Optical metrology
    • Surface characterization
    • Advanced manufacturing

    Background:

    • Modern manufacturing produces complex surfaces, challenging traditional surface metrology instruments.
    • Existing optical instruments are often limited to specific texture scales (rough or smooth).
    • A need exists for a single instrument capable of measuring a wide range of surface textures for in-situ applications.

    Purpose of the Study:

    • To introduce a novel chromatic focus variation (CFV) system for measuring optically smooth surfaces.
    • To develop a method for enabling single-instrument measurement across a wide range of surface textures.
    • To simplify metrology integration for on-machine measurements.

    Main Methods:

    • Utilizing an illumination pattern projection via a polarized pixelated mask.
    • Employing a CFV system with a dispersive objective lens and wavelength scanning.
    • Replacing mechanical motion stages with wavelength scanning for reduced equipment bulk and maintenance.

    Main Results:

    • The proposed CFV system successfully measures optically smooth surfaces.
    • The pattern projection generates local contrast, enabling measurement of both smooth and rough surfaces.
    • Experimental results demonstrate measurement of smooth surfaces with step heights up to 180 nm.

    Conclusions:

    • The developed CFV system with polarized mask projection offers a versatile solution for surface metrology.
    • The technology simplifies on-machine measurement by requiring no power at the scanning head.
    • This approach addresses the challenge of measuring diverse surface textures within a single instrument.