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Updated: Mar 21, 2026

Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Bottom-up Fabrication of Bandgap-Tunable Patterned Lateral WS2-Janus W(SxSe1-x)Se Heterostructure Arrays
Ping Lu1, Ying Huangfu2, Zhihao Li2
1Hunan Key Laboratory of Two-Dimensional Materials and State Key Laboratory of Chemo and Biosensing, College of Chemistry and Chemical Engineering, Hunan University, Changsha, China.
Abstract:
Two-dimensional (2D) heterostructures have significant application promise in electronics, optoelectronics, and integrated circuits due to their unique structural designs, high-density integration, and transformative physical properties. To establish 2D heterostructures as essential components for next-generation integrated devices, it is crucial to develop approaches for the integration of heterostructure units with varying physical properties. Herein, we demonstrate an atomic substitution method for preparing composition- and bandgap-tunable patterned lateral Janus heterostructure arrays. Patterned WS2-WSe2 lateral heterostructure arrays were synthesized through a laser-assisted epitaxial regrowth process. Then, using a hydrogen plasma-assisted sulfur substitution method at room temperature, the top layer atoms of WSe2 were sulfurized to different degrees to Janus W(SxSe1-x)Se (0 ≤ x ≤ 1), successfully fabricating WS2-Janus W(SxSe1-x)Se lateral heterostructure arrays. Notably, the composition and bandgap of W(SxSe1-x)Se are tunable with the S content, which is proved by density functional theory calculations, X-ray photoelectron spectroscopy, Raman, and photoluminescence spectra. Comprehensive characterizations prove that the lateral heterostructures remain an atomically clean and sharp interface. The successful introduction of bandgap-tunable Janus structures into monolayer lateral heterostructure arrays provides unprecedented flexibility for constructing 2D lateral heterostructures, which is important for the development of complex 2D lateral devices and integrated circuits.

