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Updated: Mar 25, 2026

Fabricating Metamaterials Using the Fiber Drawing Method
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Metamaterials from Plasma-Treated Block Copolymer Monolith.

Chien Chen1, Jui-Chang Chuang2, Ke-Hsin Yin1

  • 1Department of Chemical Engineering, National Tsing Hua University, No. 101, Section 2, Kuang-Fu Road, Hsinchu, Taiwan 30013, R.O.C.

ACS Applied Materials & Interfaces
|March 23, 2026
PubMed
Summary
This summary is machine-generated.

Researchers developed a novel method to create thin-film metamaterials from plasma-treated polymers. These metamaterials exhibit high transmittance, impact resistance, and potential applications in semiconductor devices.

Keywords:
block copolymerenergy dissipationhigh transmittancemechanical metamaterialsoptical metamaterials

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Polymer Science

Background:

  • Metamaterials offer unique optical and mechanical properties.
  • Developing cost-effective fabrication methods for metamaterials is crucial.
  • Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) is a versatile block copolymer.

Purpose of the Study:

  • To demonstrate a facile method for fabricating thin-film metamaterials.
  • To create metamaterials with high transmittance and impact resistance.
  • To explore the application of these metamaterials as protective coatings.

Main Methods:

  • Fabrication of thin-film metamaterials from plasma-treated PS-b-PDMS monoliths.
  • Utilizing oxygen plasma treatment to oxidize PDMS to SiO2 and decompose PS.
  • Characterizing the resulting nanoporous SiO2 thin film's structure and properties.

Main Results:

  • Achieved high transmittance and superior impact resistance in the fabricated metamaterials.
  • The resulting SiO2 thin film exhibited an ultralow refractive index and well-ordered nanonetwork texture.
  • Demonstrated the potential of the SiO2 nanonetwork as a ductile glass coating for indium tin oxide (ITO) conductive lines.

Conclusions:

  • The developed method provides a facile route to high-performance optical and mechanical metamaterials.
  • The nanoporous SiO2 thin films possess properties suitable for protective coatings in semiconductor devices.
  • This work highlights the potential of plasma-treated block copolymers for advanced material applications.