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Thermally Engineered Nickel-Tungsten Oxide Films for Energy Efficient Electrochromic Devices
Usha K S1,2, Sang Yeol Lee1,2
1Department of Semiconductor and Electronic Engineering, Gachon University, Seongnam-si 13120, Republic of Korea.
Nanomaterials (Basel, Switzerland)
|March 27, 2026
Summary
Optimizing substrate temperature for nickel-tungsten oxide thin films enhances smart window performance. Lower temperatures yield superior electrochromic properties due to favorable microstructure and nickel vacancies for ion transfer.
Area of Science:
- Materials Science
- Nanotechnology
- Electrochemistry
Background:
- Nickel-oxide-based materials are crucial as counter electrodes in smart windows.
- Their electrochromic properties enable reversible optical changes via ion movement.
Purpose of the Study:
- To investigate how substrate temperature affects electrochromic properties of sputtered nickel-tungsten oxide thin films.
- To correlate microstructure and defect chemistry with performance for smart window applications.
Main Methods:
- Sputtering deposition of nickel-tungsten oxide thin films at varying substrate temperatures.
- Structural analysis using Raman spectroscopy.
- Electrochromic performance evaluation including optical contrast and coloration/bleaching dynamics.
Main Results:
- Deposited films were amorphous, with lower substrate temperatures correlating to higher nickel-vacancy concentrations.
- Films produced at lower temperatures exhibited enhanced electrochromic performance.
- Superior performance included 64% optical contrast and rapid switching times (2.21s coloration, 0.93s bleaching).
Conclusions:
- Substrate temperature is a critical parameter for tuning the microstructure and defect chemistry of nickel-tungsten oxide films.
- Disordered amorphous structures and sufficient nickel vacancies at lower deposition temperatures facilitate efficient ion transfer.
- Optimized nickel-tungsten oxide thin films are promising for energy-efficient smart window counter electrodes.
