Examination within a Photonic Memory-Based Framework: Al and In Dual-Doped ZnO Thin Film UV Photosensor Devices
Emre Kartal1,2, Osman Kahveci1,2,3, Abdullah Akkaya2,4
1Department of Physics, Faculty of Sciences, Erciyes University, 38039 Kayseri, Turkiye.
ACS Applied Materials & Interfaces
|March 30, 2026
Summary
Dual doping ZnO with Al and In enhances optoelectronic performance and photoconductivity at room temperature. This dual-doped material shows improved photocurrent and photonic memory effects, ideal for advanced optoelectronic devices.
Area of Science:
- Materials Science
- Nanotechnology
- Optoelectronics
Background:
- Zinc oxide (ZnO) is a promising semiconductor material for optoelectronic applications.
- Enhancing ZnO's photoresponsive and optoelectronic properties is crucial for device performance.
- Doping is a key strategy to tailor semiconductor characteristics, but optimizing dual-doping effects requires investigation.
Purpose of the Study:
- To investigate the room-temperature enhancement of optoelectronic and photoresponsive performance in ZnO via dual doping with Aluminum (Al) and Indium (In).
- To correlate structural and morphological modifications induced by Al and In doping with improved material characteristics.
- To evaluate the potential of dual-doped ZnO for advanced optoelectronic and photonic memory applications.
Main Methods:
- Synthesis of dual-doped ZnO (Al and In) materials, confirming hexagonal wurtzite phase via structural analysis.
- Microstructural and morphological characterization, including crystallite size and particle thickness measurements.
- Systematic investigation of persistent photoconductivity, photocurrent generation mechanisms, photonic memory effects, and photosensor properties under UV illumination.
Main Results:
- Dual doping with 1.0% Al and 1.0% In reduced crystallite size (to 38.66 nm) and particle thickness (to ~201.6 nm), increasing surface:volume ratio.
- The dual-doped ZnO exhibited an approximately 11-fold increase in photocurrent under UV light compared to undoped ZnO, reaching 2.11 × 10-4 A.
- The slow decay time (τ2), indicative of memory capacity, significantly increased from 302.89 s (undoped) to 533.31 s (dual-doped), demonstrating enhanced photonic memory.
Conclusions:
- Dual doping of ZnO with Al and In effectively enhances its optoelectronic and photoresponsive characteristics at room temperature.
- The observed grain refinement and increased surface area contribute to improved sensor performance and photocurrent generation.
- The optimal doping ratio (1.0% Al/1.0% In) shows significant potential for applications in photonic memory devices, including multilevel data storage.
Related Concept Videos
Photoelectric Effect
41.1K
When light of a particular wavelength strikes a metal surface, electrons are emitted. This is called the photoelectric effect. The minimum frequency of light that can cause such emission of electrons is called the threshold frequency, which is specific to the metal. Light with a frequency lower than the threshold frequency, even if it is of high intensity, cannot initiate the emission of electrons. However, when the frequency is higher than the threshold value, the number of electrons ejected...
41.1K
Photoluminescence: Applications
1.2K
Photoluminescence offers a wide range of applications due to its inherent sensitivity and selectivity. This technique allows for both direct and indirect analyses of the analyte. Direct quantitative analysis is possible when the analyte exhibits a favorable quantum yield for fluorescence or phosphorescence. However, an indirect analysis may be feasible if the analyte is not fluorescent or phosphorescent, or if the quantum yield is unfavorable. Indirect methods include reacting the analyte with...
1.2K


