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Published on: July 24, 2015
Thickness-engineered CuInO3 Perovskite Capping Layers for Stable Graphene/Silicon Schottky Photodetectors
Kashif Abbas1, Peirui Ji1, Muhammad Faizan Ameer1
1State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, China.
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The performance of graphene/silicon (Gr/Si) Schottky photodetectors is often limited by high dark current, inefficient carrier extraction, and poor stability. Here, a thickness-tunable CuInO3 oxide perovskite nanoparticles (OPNPs) capping layer is introduced to overcome these issues. The CuInO3 OPNPs are synthesized via a microwave-assisted thermal method, exhibiting high crystallinity and strong optical absorption. By tuning the layer thickness (201-1412 nm), an interfacial dipole is engineered, increasing the Schottky barrier height from 0.84 to 0.96 eV. This results in an 87.6% reduction in dark current and over 21-fold enhancement in photocurrent under 405 nm illumination. The optimized device (201 nm) achieves a responsivity of 0.79 AW-1, detectivity of 2.0 × 1013 Jones, EQE of 242%, and a low noise-equivalent power of 7.97 × 10-14 W Hz-1/2, with fast response times (0.126/0.127 ms). Thickness-dependent analysis reveals that intermediate thickness balances electric field enhancement and carrier transport. The device also shows excellent stability, retaining ∼87% photocurrent after 30 days and stable operation over 500 cycles, demonstrating strong potential for high-performance photodetectors. Furthermore, the engineered interface suppresses recombination, enhances carrier separation, and ensures efficient tunneling, contributing to improved signal-to-noise ratio and reliable long-term device operation under ambient conditions without encapsulation for applications.

