Enhanced Far-Field Emission Via Dual Reststrahlen Bands in h-BN/SiO2 Bilayer

Yue Wen1, Sichao Li1,2, Wonjae Jeong3

  • 1Department of Mechanical Engineering, College of Design and Engineering, National University of Singapore, Singapore, 117575, Singapore.

Nano Letters
|April 6, 2026
PubMed