Related Experiment Video
Updated: Apr 15, 2026

12:32
The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
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Author Correction: Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2
Songge Zhang1,2,3, Tao Zhang1,4, Hua Yu1
1Songshan Lake Materials Laboratory, Dongguan, Guangdong, China.
Nature Communications
|April 13, 2026
Abstract
No abstract available in PubMed .
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