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Updated: Apr 23, 2026

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Epitaxial n-ZnO/MoS2/p-GaN Heterostructure Light-Emitting Diodes
Imasda Rahmatulloh, Daryll J C Dalayoan, Asad Ali1
1Department of Physics & Astronomy, Institute of Applied Physics (IAP), and Research Institute of Advanced Materials (RIAM), Seoul National University (SNU), Seoul 08826, Republic of Korea.
None:
We investigated an epitaxial strategy for fabricating MoS2 light-emitting diodes (LEDs). A full-coverage MoS2 active layer was grown on p-type GaN, and n-type ZnO nanorods were then vertically aligned on the MoS2 to form a p-n junction with negligible damage to the MoS2. All materials have nearly matched hexagonal structures, enabling single-crystal alignment. Although the continuous MoS2 film formed multiple layers (MLs), the ZnO/MoS2/GaN heterostructure yielded favorable optical characteristics of the ML-MoS2, including internal quantum efficiency comparable to that of the single-layer MoS2. The ZnO/MoS2/GaN LED exhibited stable A and B exciton emissions, which imply direct bandgap transition with spin-orbit coupling. Without mechanically exfoliated or transferred 2D films, this epitaxial approach satisfies the key requirements for fabricating 2D-based optoelectronic and quantum light sources. The strength of epitaxy, such as large-scale scalability and multiple quantum-well formation, will further advance 2D optoelectronics, making them more practical and efficient.
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