Related Experiment Video
Updated: Apr 24, 2026

Assembly and Characterization of Biomolecular Memristors Consisting of Ion Channel-doped Lipid Membranes
Published on: March 9, 2019
Robust and High-Performance Self-Rectifying Memristors Featuring a-WO3/a-IGZO Heterostructures for Reliable
Shuangju Jia1, Hongbing Lu1,2, Yuanyuan Zhu3
1School of Physics and Information Technology, Shaanxi Normal University, Xi'an 710062, China.
None:
By integrating rectification and resistive switching functionalities, self-rectifying memristors play a pivotal role for large-scale, high-density 3D integration, which can effectively suppress sneak-path currents. However, the limited reliability and poor overall performance of mainstream metal oxide-based self-rectifying memristors hinder their widespread practical application. Herein, robust self-rectifying memristors are fabricated using an amorphous WO3/amorphous IGZO (a-WO3/a-IGZO) heterostructure, and they exhibit excellent high-performance characteristics, including a high rectification ratio (>104), low operating voltages, and outstanding operational stability. This enhanced self-rectifying switching performance is attributed to the formation of an interfacial space-charge layer, resulting from the mismatch in carrier concentration between a-WO3 and a-IGZO. Furthermore, multisynaptic functions are subsequently emulated using a-WO3/a-IGZO heterostructure memristors, whose conductance can be continuously modulated. This work presents a heterostructure strategy for constructing robust, high-performance self-rectifying memristors based on amorphous metal oxides, which effectively suppress crosstalk currents and serve as reliable artificial synapses for neuromorphic computing.
Related Concept Videos
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
MOSFET
In an n-MOSFET, the structure includes n-type source and drain...
Characteristics of MOSFET
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...

