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Design of a long working distance, large aperture microscope objective for semiconductor precision inspection
Applied Optics
|April 24, 2026
Summary
This study presents a new 50× microscope objective with a large numerical aperture and extended working distance. This design enhances resolution and image quality for semiconductor defect detection.
Area of Science:
- Optical Engineering
- Microscopy
- Semiconductor Metrology
Background:
- Microscope objectives with large numerical apertures typically suffer from short working distances, limiting their application in certain industrial inspection tasks.
- Achieving high resolution and maintaining image quality across multiple wavelength ranges, including visible and laser spectra, is a significant challenge in optical design.
Purpose of the Study:
- To design and evaluate a 50× microscope objective that overcomes the short working distance limitation associated with high numerical apertures.
- To achieve a flat-field, apochromatic performance across a broad visible wavelength range (436-656 nm).
- To ensure high focusing quality for both femtosecond (770-790 nm) and YAG (1059-1069 nm) laser applications.
Main Methods:
- Optical design using advanced simulation software to optimize lens elements for aberration correction.
- Performance evaluation through resolution measurements (line pairs per millimeter) and modulation transfer function (MTF) analysis.
- Tolerance analysis to assess the design's robustness for mass production.
Main Results:
- A 50× microscope objective with a numerical aperture of 0.75 and a working distance of 6.2 mm was successfully designed.
- The objective demonstrated a resolution of 2200 lp/mm and image quality near the diffraction limit.
- The design exhibited flat-field and apochromatic characteristics for visible light and maintained high focusing quality for specified laser wavelengths.
Conclusions:
- The developed microscope objective offers a practical solution for semiconductor defect detection by combining high resolution with a long working distance.
- The design's performance and manufacturability indicate its suitability for industrial applications requiring precise optical inspection.
- This work advances the capabilities of microscopy for demanding metrology tasks in the semiconductor industry.

