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Related Concept Videos

The Phosphorus Cycle01:21

The Phosphorus Cycle

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Unlike carbon, water, and nitrogen, phosphorus is not present in the atmosphere as a gas. Instead, most phosphorus in the ecosystem exists as compounds, such as phosphate ions (PO43-), found in soil, water, sediment and rocks. Phosphorus is often a limiting nutrient (i.e., in short supply). Consequently, phosphorus is added to most agricultural fertilizers, which can cause environmental problems related to runoff in aquatic ecosystems.
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Red Phosphorus by Atomic Layer Deposition.

Raul Zazpe1,2, Jaroslav Charvot3, Jhonatan Rodriguez-Pereira1,2

  • 1Center of Materials and Nanotechnologies, Faculty of Chemical Technology, University of Pardubice, Studentska 95, 532 10 Pardubice, Czech Republic.

Nano Letters
|April 28, 2026
PubMed
Summary
This summary is machine-generated.

A new atomic layer deposition (ALD) method enables red phosphorus (RP) thin film synthesis. This breakthrough provides a reliable technique for depositing elemental red phosphorus, crucial for advanced material applications.

Keywords:
Atomic layer depositionMetal-free semiconductorNanoparticlesPhosphorus synthesisThin films

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Area of Science:

  • Materials Science
  • Chemical Engineering
  • Nanotechnology

Background:

  • Elemental red phosphorus (RP) deposition is challenging.
  • Atomic Layer Deposition (ALD) offers precise thin-film fabrication.
  • Existing methods for RP synthesis are limited.

Purpose of the Study:

  • To develop a novel ALD procedure for synthesizing red phosphorus thin films.
  • To characterize the properties of the deposited RP films.
  • To elucidate the ALD reaction mechanism for elemental phosphorus deposition.

Main Methods:

  • Utilized tin tetrachloride and tris(trimethyltin)phosphide as precursors for ALD.
  • Determined the optimal ALD temperature window (175–200 °C).
  • Employed various characterization techniques (e.g., spectroscopy, microscopy) and density functional theory (DFT) calculations.

Main Results:

  • Successfully deposited elemental red phosphorus thin films using ALD.
  • Confirmed the self-limiting nature of the process within the identified ALD window.
  • Characterized films on diverse substrates (Si/SiO2, glass, carbon paper) showing pure RP.
  • Determined an optical bandgap of ≈1.9 eV, indicating semiconducting behavior.
  • DFT calculations proposed a reaction mechanism involving ligand exchange and redox steps.

Conclusions:

  • Introduced a new ALD precursor combination for elemental red phosphorus deposition.
  • Extended the range of ALD precursors and addressed the lack of elemental P deposition methods.
  • The developed method provides a pathway for controlled synthesis of RP thin films for potential applications.