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Updated: May 3, 2026

Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes
Published on: June 25, 2020
GeSn QD decorated graphene/n-Ge mixed-dimensional heterostructure for extended shortwave infrared detection
Abstract:
We report an all-group-IV photodiode enabling extended shortwave infrared detection by integrating sputtered Ge0.84Sn0.16 quantum dots (QDs) on a graphene (Gr)/n-Ge substrate via quasi-van der Waals epitaxy. The Fermi level depinning of n-Ge by Gr and work function modulation of Gr by GeSn QDs enhance the Schottky barrier height between GeSn-QDs decorated Gr and n-Ge to 0.49 eV, thus suppressing the dark current. The GeSn QDs facilitate the extension of the detection range up to 2400 nm and naturally act as hole trapping centers producing photocurrent gain. Consequently, high responsivities of 2.4/1.8 A/W at 1310/1550 nm with corresponding detectivities of 1.4 × 1010/1.1 × 1010 Jones alongside a fast response time of <60 µs were achieved. This approach presents a robust, cost-effective solution for extending the spectral range of Si-based photonics.

