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Yuan Qie1, Kai Xie2, Chengxiang Zhao3
1Department of Physics and Electronic Engineering, Jinzhong University, Jinzhong 030619, P. R. China.
Direct photolithography enables precise quantum dot (QD) patterning for optoelectronic devices. This method utilizes a self-cross-linking polymer to create high-resolution QD arrays and suppress leakage current in quantum dot light-emitting devices (QLEDs).
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